高温退火降低碳纳米管接触电阻的实验研究

安立宝; 李文; 陈佳

doi:10.11936/bjutxb2016050060

高温退火降低碳纳米管接触电阻的实验研究

doi: 10.11936/bjutxb2016050060

华北理工大学机械工程学院, 河北唐山 063009

基金项目: 国家自然科学基金资助项目(51172062,51472074)；河北省“百人计划”资助项目(E2012100005)

详细信息

作者简介:
作者简介: 安立宝(1965—), 男, 教授, 主要从事微纳制造技术、先进纳米材料特性及应用方面的研究, E-mail:lan@ncst.edu.cn

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出版历程
- 收稿日期: 2016-05-23
- 网络出版日期: 2022-09-13
- 刊出日期: 2017-02-01

Experimental Research of Reducing the Contact Resistance of Carbon Nanotubes by High Temperature Annealing

College of Mechanical Engineering, North China University of Science and Technology, Tangshan 063009, Hebei, China

摘要

摘要: 将碳纳米管有效地集成到微纳器件上实现组装是碳纳米管在众多领域得以应用的先决条件,组装后较高的接触电阻成为影响碳纳米管器件性能的重要因素,为了降低碳纳米管与电极之间的接触电阻,采用高温退火法对组装后的碳纳米管进行处理. 首先,通过介电电泳法组装碳纳米管;其次,利用正交试验设计和方差分析研究高温退火过程中退火温度、保温时间和升温速率对降低碳纳米管接触电阻的影响,并获得了降低接触电阻的最优参数组合;最后,对退火前后碳纳米管的I-V特性进行测量、分析. 结果表明:高温退火可以简单、高效地降低碳纳米管的接触电阻,退火温度是影响降阻效果的主要因素,退火处理后接触电阻的下降幅度最高可达91.59%,组装的碳纳米管退火前后的I-V特性曲线均呈现良好的线性.
- 碳纳米管 /
- 接触电阻 /
- 高温退火 /
- 正交试验 /
- 介电电泳
Abstract: Integrating carbon nanotubes(CNTs) into micro- and nano- devices is a critical step for applying CNTs in many fields. The high contact resistance of assembled CNTs is an important factor influencing the performance of CNT-based devices. It is possible to reduce the contact resistant of CNTs by using high temperature annealing. First, CNTs were assembled by dielectrophoresis; Second, the effects of annealing temperature, annealing time, and heating rate of reducing the contact resistance of CNTs were investigated by using orthogonal experiment design and variance analysis, and the optimal parameter combination for reducing the contact resistance was obtained; Finally, the I-V characteristic before and after annealing were measured respectively. Results show that the contact resistant of CNTs can be reduced efficiently by using high temperature annealing, and the annealing temperature is the leading factor causing the reduction of the resistance. After annealing, the contact resistance can be reduced at the most by 91.59%. The I-V curves of assembled CNTs are both linear before and after annealing.
- carbon nanotube /
- contact resistance /
- high temperature annealing /
- orthogonal experiment design /
- dielectrophoresis
The authors have declared that no competing interests exist.

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图 1 碳纳米管在电路中的组装形态

Figure 1. Morphology of assembled CNTs in circuits

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图 2 组装后的碳纳米管在不同时段的I-V曲线

Figure 2. I-V curves of assembled CNTs at different times

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表 1 退火温度、保温时间、升温速率的水平选取

Table 1. Levels of annealing temperature, annealing time, and heating rate

水平	退火温度/℃	保温时间/min	升温速率/(℃·min^-1)
1	200	15	10
2	300	25	15
3	400	35	20

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表 2 正交试验设计方案

Table 2. Orthogonal experiment design

编号	退火温度/℃	保温时间/min	升温速率/(℃·min^-1)	电阻下降幅度/%
1	200	15	10	53.48
2	200	25	15	64.32
3	200	35	20	66.15
4	300	15	15	90.47
5	300	25	20	91.32
6	300	35	10	71.91
7	400	15	20	91.59
8	400	25	10	79.73
9	400	35	15	75.55

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表 3 极差分析结果

Table 3. Results of range analysis

K/R	退火温度/℃	保温时间/min	升温速率/(℃·min^-1)
K₁	53.48+64.32+66.15=183.95	53.48+90.47+91.59=235.54	53.48+71.91+79.73=205.12
K₂	90.47+91.32+71.91=253.70	64.32+91.32+79.73=235.37	64.32+90.47+75.55=230.34
K₃	91.59+79.73+75.55=246.87	66.15+71.91+75.55=213.61	66.15+91.32+91.59=249.06
$\begin{matrix} {\bar{K}}_{1} \end{matrix}$ =K₁/3	183.95/3=61.32	235.54/3=78.51	205.12/3=68.37
$\begin{matrix} {\bar{K}}_{2} \end{matrix}$ =K₂/3	253.70/3=84.57	235.37/3=78.46	230.34/3=76.78
$\begin{matrix} {\bar{K}}_{3} \end{matrix}$ =K₃/3	246.87/3=82.29	213.61/3=71.20	249.06/3=83.02
R=max{ $\begin{matrix} {\bar{K}}_{i} \end{matrix}$ }-min{ $\begin{matrix} {\bar{K}}_{i} \end{matrix}$ }	84.57-61.31=23.26	78.51-71.20=7.31	83.02-68.37=14.65
注:K₁、K₂、K₃是各因素在水平1、2、3下的电阻下降幅度之和; $\begin{matrix} {\bar{K}}_{1} \end{matrix}$ 、 $\begin{matrix} {\bar{K}}_{2} \end{matrix}$ 、 $\begin{matrix} {\bar{K}}_{3} \end{matrix}$ 是K₁、K₂、K₃的平均值;R是极差值.

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表 4 方差分析结果

Table 4. Results of variance analysis

项目	偏差平方和S	自由度f	方差V	F值	显著性
退火温度	985.626	2	492.813	23.067	*
保温时间	106.050	2	53.025	2.482
升温速率	324.134	2	162.067	7.586	[*]
误差e	42.729	2	21.365
总和T	1458.540	8

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参考文献(16)

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高温退火降低碳纳米管接触电阻的实验研究

doi: 10.11936/bjutxb2016050060

作者简介:
作者简介: 安立宝(1965—), 男, 教授, 主要从事微纳制造技术、先进纳米材料特性及应用方面的研究, E-mail:lan@ncst.edu.cn

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Experimental Research of Reducing the Contact Resistance of Carbon Nanotubes by High Temperature Annealing

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高温退火降低碳纳米管接触电阻的实验研究

doi: 10.11936/bjutxb2016050060

作者简介: 作者简介: 安立宝(1965—), 男, 教授, 主要从事微纳制造技术、先进纳米材料特性及应用方面的研究, E-mail:lan@ncst.edu.cn

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Experimental Research of Reducing the Contact Resistance of Carbon Nanotubes by High Temperature Annealing

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作者简介:
作者简介: 安立宝(1965—), 男, 教授, 主要从事微纳制造技术、先进纳米材料特性及应用方面的研究, E-mail:lan@ncst.edu.cn